APA   Click to copy
Schaefer, A., Sandell, A., Walle, L. E., Zielasek, V., Schowalter, M., Rosenauer, A., & Bäumer, M. (2010). Chemistry of thin film formation and stability during praseodymium oxide deposition on Si(111) under oxygen-deficient conditions. Surface Science, 604, 1287–1293. https://doi.org/10.1016/j.susc.2010.04.016

Chicago/Turabian   Click to copy
Schaefer, A., A. Sandell, L.E. Walle, V. Zielasek, M. Schowalter, A. Rosenauer, and M. Bäumer. “Chemistry of Thin Film Formation and Stability during Praseodymium Oxide Deposition on Si(111) under Oxygen-Deficient Conditions.” Surface Science 604 (2010): 1287–1293.

MLA   Click to copy
Schaefer, A., et al. “Chemistry of Thin Film Formation and Stability during Praseodymium Oxide Deposition on Si(111) under Oxygen-Deficient Conditions.” Surface Science, vol. 604, 2010, pp. 1287–93, doi:10.1016/j.susc.2010.04.016.

@article{schaefer2010a,
  title = {Chemistry of thin film formation and stability during praseodymium oxide deposition on Si(111) under oxygen-deficient conditions},
  year = {2010},
  journal = {Surface Science},
  pages = {1287-1293},
  volume = {604},
  doi = {10.1016/j.susc.2010.04.016},
  author = {Schaefer, A. and Sandell, A. and Walle, L.E. and Zielasek, V. and Schowalter, M. and Rosenauer, A. and Bäumer, M.}
}